Ion fluxes and energies in inductively coupled radio-frequency discharges containing C2F6 and c-C4F8

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2785-2790

  Goyette, A N ^a   Wang, Yicheng ^a   Misakian, M ^a   Olthoff, J K ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRODES; ENERGY DISSIPATION; ION BEAMS; IONIZATION; PLASMA DEVICES;

ION ENERGY DISTRIBUTIONS (IED); ION FLUXES;

CARBON INORGANIC COMPOUNDS;

EID: 0034316782     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1308590     Document Type: Article

References (17)

1. K. Kurihara and M. Sekino, Plasma Sources Sci. Technol. 5, 121 (1996).
2. S. Sasaki, Y. Hirose, I. Ishikawa, K. Nagaseki, Y. Saito, and S. Suganomata, Jpn. J. Appl. Phys., Part 1 30, 5296 (1997).
3. Y. Hirose, I. Ishikawa, S. Sasaki, K. Nagaseki, Y. Saito, and S. Suganomata, Jpn. J. Appl. Phys., Part 1 37, 5730 (1997).
4. R. Jayaraman, R. T. McGrath, and G. A. Hebner, J. Vac. Sci. Technol. A 17, 1545 (1999).
5. X. Li, M. Schaepkens, G. S. Oehrlein, R. E. Ellefson, L. C. Frees, N. Mueller, and N. Komer, J. Vac. Sci. Technol. A 17, 2438 (1999).
6. P. A. Miller, G. A. Hebner, K. E. Greenberg, P. S. Pochan, and B. P. Aragon, J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995).
7. P. J. Hargis et al., Rev. Sci. Instrum. 65, 140 (1994).
8. J. K. Olthoff and K. E. Greenberg, J. Res. Natl. Inst. Stand. Technol. 100, 327 (1995).
9. J. K. Olthoff and Y. Wang, J. Vac. Sci. Technol. A 17, 1552 (1999).
10. Y. Wang and J. K. Olthoff, J. Appl. Phys. 85, 6358 (1999).
11. M. V. V. S. Rao, R. J. Van Brunt, and J. K. Olthoff, Phys. Rev. E 54, 5491 (1996).
12. C. Q. Jiao, A. Garscadden, and P. D. Haaland, Chem. Phys. Lett. 310, 52 (1999).
13. Y. Wang, M. Misakian, A. N. Goyette, and J. K. Olthoff, J. Appl. Phys. (to be published).
14. J. Hopwood, Appl. Phys. Lett. 62, 940 (1993).
15. J. T. Gudmundsson, Plasma Sources Sci. Technol. 8, 58 (1999).
16. C. Q. Jiao, A. Garscadden, and P. D. Haaland, Chem. Phys. Lett. 297, 121 (1998).
17. L. G. Christophorou, D. L. McCorkle, and A. A. Christodoulides, in Electron Attachment Processes, Vol. 1 of Electron-Molecule Interactions and Their Applications, edited by L. G. Christophorou (Academic, Orlando, 1984), Chap. 6, pp. 478-618.