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Volumn 43, Issue 12, 2004, Pages 7909-7920

Thin-film silicon - Growth process and solar cell application

Author keywords

Amorphous silicon; Microcrystalline silicon; Photo induced degradation; Plasma enhanced chemical vapor deposition; Reactive plasma; Solar cells

Indexed keywords

COST EFFECTIVENESS; GLOW DISCHARGES; GROUND STATE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SOLAR CELLS; THIN FILMS; ULTRAVIOLET RADIATION;

EID: 13744253789     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.7909     Document Type: Review
Times cited : (181)

References (53)
  • 3
    • 0021658879 scopus 로고
    • ed. J. Pancove Academic Press, New York
    • T. Moustakas: Semiconductors and Semimetals 21A, ed. J. Pancove (Academic Press, New York, 1984) p. 55.
    • (1984) Semiconductors and Semimetals , vol.21 A , pp. 55
    • Moustakas, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.