Surface interactions of CF2 radicals during deposition of amorphous fluorocarbon films from CHF3 plasmas

Journal of Applied Physics

Volumn 84, Issue 9, 1998, Pages 4736-4743

  Capps, Nathan E ^a   Mackie, Neil M ^a   Fisher, Ellen R ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000863063     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368716     Document Type: Article

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