Ion effects on CF 2 surface interactions during C 3F 8 and C 4F 8 plasma processing of Si

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 5, 2004, Pages 2168-2176

  Martin, Ina T ^a   Fisher, Ellen R ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING OF RADICALS INTERACTING WITH SURFACES (IRIS); PLASMA PROCESSING; RADIO FREQUENCY (RF) POWER; SOURCE PRESSURE;

AMORPHOUS MATERIALS; COMPOSITION; DEPOSITION; ETCHING; MASS SPECTROMETRY; PLASMAS; SURFACE STRUCTURE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUOROCARBONS;

EID: 8444253742     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1781180     Document Type: Article

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