Laser-induced fluorescence detection and kinetics of SiH2 radicals in Ar/H2/SiH4 RF discharges

Journal of Physics D: Applied Physics

Volumn 33, Issue 4, 2000, Pages 381-388

  Hertl, Michael ^a   Jolly, Jacques ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; EMISSION SPECTROSCOPY; FLUORESCENCE; FREE RADICALS; GLOW DISCHARGES; HYDROGEN; LASER BEAM EFFECTS; NITROGEN; PLASMAS; RATE CONSTANTS; RAYLEIGH SCATTERING;

LASER-INDUCED FLUORESCENCE (LIF);

SILANES;

EID: 0033893372     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/33/4/311     Document Type: Article

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