Correlating ion energies and CF 2 surface production during fluorocarbon plasma processing of silicon

Journal of Applied Physics

Volumn 100, Issue 1, 2006, Pages

  Martin, Ina T ^a   Zhou, Jie ^a   Fisher, Ellen R ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING OF RADICALS INTERACTING WITH SURFACES (IRIS); ION ENERGY DISTRIBUTION (IED); MEAN ION ENERGIES; PLASMA MOLECULAR BEAM SOURCES;

CORRELATION METHODS; FLUOROCARBONS; IMAGING TECHNIQUES; IONS; MASS SPECTROMETERS; MOLECULAR BEAMS;

PLASMAS;

EID: 33746216153     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2206973     Document Type: Article

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