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Volumn 101, Issue 46, 1997, Pages 9425-9428

Surface reactivity of CF2 radicals measured using laser-induced fluorescence and C2F6 plasma molecular beams

Author keywords

[No Author keywords available]

Indexed keywords

FLUORESCENCE; FREE RADICALS; MOLECULAR BEAMS; MOLECULAR DYNAMICS; PLASMA APPLICATIONS; PLASTIC FILMS; REACTION KINETICS; SUBSTRATES; SURFACE PHENOMENA;

EID: 0031269353     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp972434v     Document Type: Article
Times cited : (36)

References (45)
  • 2
    • 0346746218 scopus 로고
    • Kitamura, M.; Akiya, H.; Urisu, T. J. Vac. Sci. Technol. B 1989, 7, 14-18. Kay, E.; Dilks, A. Thin Solid Films 1981, 78, 308-318.
    • (1981) Thin Solid Films , vol.78 , pp. 308-318
    • Kay, E.1    Dilks, A.2
  • 3
    • 21544431507 scopus 로고
    • Kadono, M.; Inoue, T.; Miyanaga, A.; Yamazaki, S. Appl. Phys. Lett. 1992, 61, 772-773. d'Agostino, R.; Lamendola, R.; Favia, P.; Giquel, A. J. Vac. Sci. Technol. A 1994, 12, 308-313. Sah, R. E.; Dishler, B.; Bubenzer, A.; Koidl, P. Appl. Phys. Lett. 1985, 46, 739-741.
    • (1992) Appl. Phys. Lett. , vol.61 , pp. 772-773
    • Kadono, M.1    Inoue, T.2    Miyanaga, A.3    Yamazaki, S.4
  • 4
    • 77950370700 scopus 로고
    • Kadono, M.; Inoue, T.; Miyanaga, A.; Yamazaki, S. Appl. Phys. Lett. 1992, 61, 772-773. d'Agostino, R.; Lamendola, R.; Favia, P.; Giquel, A. J. Vac. Sci. Technol. A 1994, 12, 308-313. Sah, R. E.; Dishler, B.; Bubenzer, A.; Koidl, P. Appl. Phys. Lett. 1985, 46, 739-741.
    • (1994) J. Vac. Sci. Technol. A , vol.12 , pp. 308-313
    • D'Agostino, R.1    Lamendola, R.2    Favia, P.3    Giquel, A.4
  • 5
    • 36549099068 scopus 로고
    • Kadono, M.; Inoue, T.; Miyanaga, A.; Yamazaki, S. Appl. Phys. Lett. 1992, 61, 772-773. d'Agostino, R.; Lamendola, R.; Favia, P.; Giquel, A. J. Vac. Sci. Technol. A 1994, 12, 308-313. Sah, R. E.; Dishler, B.; Bubenzer, A.; Koidl, P. Appl. Phys. Lett. 1985, 46, 739-741.
    • (1985) Appl. Phys. Lett. , vol.46 , pp. 739-741
    • Sah, R.E.1    Dishler, B.2    Bubenzer, A.3    Koidl, P.4
  • 36
    • 85088078917 scopus 로고    scopus 로고
    • note
    • 6 plasma molecular beam.
  • 40
    • 4043167521 scopus 로고    scopus 로고
    • note
    • XPS analysis of IRIS substrates indicates the films deposited under these conditions are nearly identical with those deposited directly in the plasma reactor as reported in ref 3.
  • 44
    • 0028590820 scopus 로고
    • ACS Advances in Chemistry Series 240
    • Panchalingam, V.; Chen, X.; Savage, C. R.; Timmons, R. B.; Eberhart, C. J. Appl. Polym. Sci.: Polym. Symp. 1994, 54, 123-141. Savage, C. R.; Timmons, R. B.; Lin, J. W. In Structure-Property Relations in Polymers; ACS Advances in Chemistry Series 240; 1993, pp 745-768.
    • (1993) Structure-Property Relations in Polymers , pp. 745-768
    • Savage, C.R.1    Timmons, R.B.2    Lin, J.W.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.