Temperature and density of CF radicals in 60 MHz capacitively coupled fluorocarbon gas plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 3 A, 2007, Pages 1176-1180

  Nagai, Mikio ^a   Hori, Masaru ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

CF; Density; Etching; Fluorocarbon; IRLAS; Low k; Plasma; Rotational; Temperature

Indexed keywords

ETCHING; OPTICAL EMISSION SPECTROSCOPY; PLASMAS; SEMICONDUCTOR LASERS; TEMPERATURE MEASUREMENT;

EMISSION SPECTRA; ROTATIONAL TEMPERATURES;

FLUOROCARBONS;

EID: 34547879334     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.1176     Document Type: Article

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