Monitoring of direct reactions during etching of silicon

Materials Research Society Symposium - Proceedings

Volumn 406, Issue , 1996, Pages 33-38

  Giapis, K P ^a   Minton, T K ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC BEAMS; DESORPTION; ETCHING; FLUORINE; MASS SPECTROMETERS; MONITORING; SCATTERING; SURFACES;

DIRECT REACTIONS; HYPERTHERMAL FLUORINE ATOM BEAM; MAXWELL BOLTZMANN DISTRIBUTION; QUADRUPOLE MASS SPECTROMETERS; STEADY STATE ETCHING;

SEMICONDUCTING SILICON;

EID: 0029777837     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)