Insights into sticking of radicals on surfaces for smart plasma nano-processing

Applied Surface Science

Volumn 253, Issue 16, 2007, Pages 6657-6671

  Hori, Masaru ^a   Goto, Toshio ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b CHUBU UNIVERSITY   (Japan)

Author keywords

Loss probability; Plasma processing; Radical; Sticking

Indexed keywords

PLASMA APPLICATIONS; REACTION KINETICS; SUBSTRATES; SURFACE REACTIONS; SURFACE TREATMENT;

AUTONOMOUS PRODUCTION DEVICES; LOSS PROBABILITY; NANO-SCALE PLASMA PROCESSING; STICKING;

FREE RADICALS;

EID: 34248366587     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.02.006     Document Type: Article

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