-
3
-
-
0024054593
-
-
Itabashi N, Kato K, Nishiwaki N, Goto T, Yamada C and Hirota E 1988 Japan. J. Appl. Phys. 27 L1565
-
(1988)
Japan. J. Appl. Phys.
, vol.27
-
-
Itabashi, N.1
Kato, K.2
Nishiwaki, N.3
Goto, T.4
Yamada, C.5
Hirota, E.6
-
13
-
-
0000478777
-
-
Lo C W, Shuh D K, Chakarian V, Durbin T D, Varekamp P R and Yarmoff J A 1993 Phys. Rev. B 47 15648
-
(1993)
Phys. Rev. B
, vol.47
, pp. 15648
-
-
Lo, C.W.1
Shuh, D.K.2
Chakarian, V.3
Durbin, T.D.4
Varekamp, P.R.5
Yarmoff, J.A.6
-
14
-
-
0000987832
-
-
Anthony B, Breaux L, Hsu T, Banerjee S and Tasch A 1989 J. Vac. Sci. Technol. B 7 621
-
(1989)
J. Vac. Sci. Technol. B
, vol.7
, pp. 621
-
-
Anthony, B.1
Breaux, L.2
Hsu, T.3
Banerjee, S.4
Tasch, A.5
-
19
-
-
0028462907
-
-
Tachibana K, Shirafuji T, Hayashi Y, Maekawa S and Monta T 1994 Japan. J. Appl. Phys. 33 4191
-
(1994)
Japan. J. Appl. Phys.
, vol.33
, pp. 4191
-
-
Tachibana, K.1
Shirafuji, T.2
Hayashi, Y.3
Maekawa, S.4
Monta, T.5
-
22
-
-
0001154868
-
-
Aydil E S, Giapis K P, Gottscho R A, Donnelly V M and Yoon E 1993 J. Vac. Sci. Technol. B 11195
-
(1993)
J. Vac. Sci. Technol. B
, vol.11
, pp. 195
-
-
Aydil, E.S.1
Giapis, K.P.2
Gottscho, R.A.3
Donnelly, V.M.4
Yoon, E.5
-
35
-
-
0032353245
-
-
Kroesen G M W, Lee H J, Moriguchi H, Motomura H, Shirafuji T and Tachibana K 1998 J. Vac. Sci. Technol. A 16 225
-
(1998)
J. Vac. Sci. Technol. A
, vol.16
, pp. 225
-
-
Kroesen, G.M.W.1
Lee, H.J.2
Moriguchi, H.3
Motomura, H.4
Shirafuji, T.5
Tachibana, K.6
-
39
-
-
1842550607
-
-
ed R d'Agostino et al, Department of Chemistry, University of Bari, Taormina, Italy
-
Motomura H, Shirafuji T, Nakamura T and Tachibana K 2003 Int. Union Pure Appl. Chem. Int. Plasma Chem. Soc.: Proc. 16th Int. Symp. Plasma Chem. ed R d'Agostino et al, Department of Chemistry, University of Bari, Taormina, Italy
-
(2003)
Int. Union Pure Appl. Chem. Int. Plasma Chem. Soc.: Proc. 16th Int. Symp. Plasma Chem.
-
-
Motomura, H.1
Shirafuji, T.2
Nakamura, T.3
Tachibana, K.4
-
56
-
-
0000478777
-
-
Lo C W, Shuh D K, Chakarian V, Durbin T D, Varekamp P R and Yarmoff J A 1993 Phys. Rev. B 47 15648
-
(1993)
Phys. Rev. B
, vol.47
, pp. 15648
-
-
Lo, C.W.1
Shuh, D.K.2
Chakarian, V.3
Durbin, T.D.4
Varekamp, P.R.5
Yarmoff, J.A.6
-
64
-
-
0012004803
-
-
Den S, Kuno T, Ito M, Hori M and Goto T 1996 Japan. J. Appl. Phys. 35 6528
-
(1996)
Japan. J. Appl. Phys.
, vol.35
, pp. 6528
-
-
Den, S.1
Kuno, T.2
Ito, M.3
Hori, M.4
Goto, T.5
-
65
-
-
21844510712
-
-
Haverlag M, Stoffels E, Stoffels W W, Kroesen G M W and de Hoog F J 1994 J. Vac. Sci. Technol. A 12 3102
-
(1994)
J. Vac. Sci. Technol. A
, vol.12
, pp. 3102
-
-
Haverlag, M.1
Stoffels, E.2
Stoffels, W.W.3
Kroesen, G.M.W.4
De Hoog, F.J.5
-
71
-
-
0033479880
-
-
Schaepkens M, Standaert T E F M, Rueger N R, Sebel P G M and Oehrlein G S 1999 J. Vac. Sci. Technol. A 17 26
-
(1999)
J. Vac. Sci. Technol. A
, vol.17
, pp. 26
-
-
Schaepkens, M.1
Standaert, T.E.F.M.2
Rueger, N.R.3
Sebel, P.G.M.4
Oehrlein, G.S.5
-
74
-
-
0035307713
-
-
Kikkawa T 2001 Electron. Commun. Japan 84 (part 2) 26 (translated from Denshi Joho Tsushin Gakkai Ronbunshi, vol J83-C, No 2, February 2000, pp 105-17)
-
(2001)
Electron. Commun. Japan
, vol.84
, Issue.PART 2
, pp. 26
-
-
Kikkawa, T.1
-
75
-
-
1842446029
-
-
translated from, February
-
Kikkawa T 2001 Electron. Commun. Japan 84 (part 2) 26 (translated from Denshi Joho Tsushin Gakkai Ronbunshi, vol J83-C, No 2, February 2000, pp 105-17)
-
(2000)
Denshi Joho Tsushin Gakkai Ronbunshi
, vol.J83-C
, Issue.2
, pp. 105-117
-
-
-
78
-
-
33845468902
-
-
Nagai H, Takashima S, Hiramatsu M, Hori M and Goto T 2002 J. Appl. Phys. 91 2615
-
(2002)
J. Appl. Phys.
, vol.91
, pp. 2615
-
-
Nagai, H.1
Takashima, S.2
Hiramatsu, M.3
Hori, M.4
Goto, T.5
-
81
-
-
85024773994
-
-
Morikawa Y, Yasunami S, Chen W, Hayashi T and Uchida T 2001 J. Vac. Sci. Technol. A 19 1747
-
(2001)
J. Vac. Sci. Technol. A
, vol.19
, pp. 1747
-
-
Morikawa, Y.1
Yasunami, S.2
Chen, W.3
Hayashi, T.4
Uchida, T.5
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