The search for growth precursors in reactive plasmas: From nanoparticles to microplasmas

Plasma Sources Science and Technology

Volumn 16, Issue 1, 2007, Pages

  Von Keudell, A ^a   Kim, I ^a   Consoli, A ^a   Schulze, M ^a   Yanguas Gil, A ^a   Benedikt, J ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; FILM GROWTH; MASS SPECTROMETRY; OPTIMIZATION; PLASMA DIAGNOSTICS;

PLASMA CHEMISTRY; SUBSTRATE SURFACES; SURFACE PROCESSES;

PLASMA SOURCES;

EID: 33947660048     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/16/1/S10     Document Type: Conference Paper

References (41)

1. Donnelly V, Flamm D and Bruce R 1985 J. Appl. Phys. 58 2135
2. Cicala C, Losurdo M, Capezzuto P and Bruno G 1992 Plasma Sources Technol. 1 156
3. Coburn J and Chen M 1980 J. Appl. Phys. 51 3134
4. Kae-Nune P, Perrin J, Guillon J and Jolly J 1994 Japan. J. Appl. Phys. 33 4303
5. Kessels W, Bogaerts M, Hoefnagels J, Schram D and van de Sanden M 2001 J. Vac. Sci. Technol. A 19 1027
6. Yasuda H and Hsu T 1978 Surf. Sci. 76 232
7. Rutscher A and Wagner H 1993 Plasma Sources Sci. Technol. 2 279
8. Hegemann D, Schütz U and Fischer A 2005 Surf. Coat. Technol. 200 458
9. Bauer M, Schwarz-Selinger T, Kang H and von Keudell A 2005 Plasma Sources Sci. Technol. 14 543
10. Bauer M, Schwarz-Selinger T, Jacob W and von Keudell A 2005 J. Appl. Phys. 98 73302
11. Winder E and Gleason K 2000 J. Appl. Polym. Sci. 78 842
12. Limb S, Edell D, Gleason E and Gleason K 1998 J. Appl. Polym. Sci. 67 1489
13. Schwarz-Selinger T, von Keudell A and Jacob W 1999 J. Appl. Phys. 86 3988
14. Hopf C, Letourneur K, Jacob W, Schwarz-Selinger T and von Keudell A 1999 Appl. Phys. Lett. 74 3800
15. Perrin J, Takeda Y, Hirano N, Takeuchi Y and Matsuda A 1989 Surf. Sci. 210 114
16. von Keudell A and Jacob W 2004 Prog. Surf. Sci. 76 21
17. Barabasi A and Stanley H 1994 Fractal Concepts in Surface Growth 1st edn (Cambridge: Cambridge University Press)
18. Flewitt A, Roberston J and Milne W 1999 J. Appl. Phys. 85 8032
19. Sperling B A and Abelson J R 2004 Appl. Phys. Lett. 85 3456
20. Tanenbaum D, Laracuente A and Gallagher A 1997 Phys. Rev. B 56 4243
21. Collins R and Yang B 1989 J. Vac. Sci. Technol. B 7 1155
22. Sarma S D and Tamborenea P 1991 Phys. Rev. Lett. 66 325
23. Smets A H M, Kessels W M M and van de Sanden M C M 2003 Appl. Phys. Lett. 82 865
24. Kessels W 2006 private communication
25. Kim I, Hong S, Consoli A, Benedikt J and von Keudell A 2006 J. Appl. Phys. 100 53302
26. Bouchoule A 1999 Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing 1st edn (New York: Wiley)
27. Hollenstein C 2000 Plasma. Phys. Control. Fusion 42 R93
28. Schulze M, von Keudell A and Awakowicz P 2006 Appl. Phys. Lett. 88 141503
29. Schulze M, von Keudell A and Awakowicz P 2006 Plasma Sources Sci. Technol. 15 556
30. Yanguas-Gil A, Focke K, Benedikt J and von Keudell A 2007 J. Appl. Phys. submitted
31. Bendikt J, Focke K, Yanguas-Gil A and von Keudell A 2007 Appl. Phys. Lett. accepted
32. Morrison N, William C and Milne W 2003 J. Appl. Phys. 94 7031
33. Pecher P 1997 Quantitative bestimmung der teilchenfluessaus methan-ECR-Plasmen PhD Thesis Universität Bayreuth
34. Kline L E 1988 J. Appl. Phys. 65 70
35. Perrin J, Shiratani M, Kae-Nune P, Videlot H, Jolly J and Guillon J 1998 J. Vac. Sci. Technol. A 16 278
36. Villain J 1991 J. Phys. I. 1 19
37. Hopf C, Schwarz-Selinger T, Jacob W and von Keudell A 2000 J. Appl. Phys 87 2719
38. Schmidt W U, Alkire R and Gerwirth A 1996 J. Electrochem. Soc. 143 3122
39. Fontcuberta i Morral A, Hofmeister H and Roca i Cabarrocas P 2002 J. Non-Cryst. Solids 299-302 284
40. Suendo V, Patriarche G and Cabarocas P R I 2005 Opt. Mat. 27 953
41. Shen Z, Kim T, Kortshagen U, McCurry P and Campbell S 2003 J. Appl. Phys. 94 2277