A technique for temperature mapping in fluorocarbon plasmas using planar laser-induced fluorescence of CF

Journal of Applied Physics

Volumn 96, Issue 1, 2004, Pages 71-81

  Steffens, Kristen L ^a   Sobolewski, Mark A ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GASEOUS ELECTRONICS CONFERENCE (GEC); OPTICAL ACCESS; PLANAR LASER-INDUCED FLUORESCENCE (PLIF); PLASMA CHEMISTRY;

CHEMICAL REACTIONS; DATA REDUCTION; ELECTRODES; ELECTRON CYCLOTRON RESONANCE; ELECTRON DENSITY MEASUREMENT; FEEDBACK CONTROL; FLUOROCARBONS; MICROELECTRONIC PROCESSING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; SILICON WAFERS;

PLASMAS;

EID: 3142747648     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1757027     Document Type: Article

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