Fabrication of 0.1 μm gate aperture Mo-tip field-emitter arrays using interferometric lithography

Applied Physics Letters

Volumn 74, Issue 20, 1999, Pages 3050-3052

  Choi, J O ^a   Jeong, H S ^a   Pflug, D G ^b   Akinwande, A I ^b   Smith, H I ^b  

^a Ajou University   (South Korea)

^b Department of Electrical Engineering and Computer Science   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003613470     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124061     Document Type: Article

References (12)

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