Digital electrostatic electron-beam array lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2646-2650

  Baylor, L R ^a   Lowndes, D H ^a   Simpson, M L ^a   Thomas, C E ^a,b   Guillorn, M A ^a   Merkulov, V I ^a   Whealton, J H ^a   Ellis, E D ^a   Hensley, D K ^a   Melechko, A V ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b nLine Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBES; ELECTRON OPTICS; ELECTRON SCATTERING; ELECTROSTATIC LENSES; FIELD EMISSION CATHODES; FOCUSING; INTEGRATED CIRCUITS; LOGIC CIRCUITS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON WAFERS;

DIGITAL ELECTROSTATIC ELECTRON BEAM LITHOGRAPHY; DIGITALLY ADDRESSABLE FIELD EMISSION ARRAY; ELECTROSTATIC FOCUSING; PROXIMITY EFFECT; VERTICALLY ALIGNED CARBON NANOFIBERS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036883135     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520559     Document Type: Article

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