Field emission from 4.5 in. single-walled and multiwalled carbon nanotube films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 2, 2000, Pages 1054-1058

  Chung, D S ^a   Choi, W B ^a   Kang, J H ^a   Kim, H Y ^a   Han, I T ^a   Park, Y S ^b   Lee, Y H ^b   Lee, N S ^a   Jung, J E ^a   Kim, J M ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC DISCHARGES; FIELD EMISSION CATHODES; HELIUM; OPTICAL VARIABLES MEASUREMENT; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT;

FIELD EMISSION; MULTIWALLED CARBON NANOTUBE TIPS; SINGLE-WALLED CARBON NANOTUBE TIPS; SURFACE RUBBING;

NANOTUBES;

EID: 0034155794     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591327     Document Type: Article

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