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Journal of Physics D: Applied Physics

Volumn 33, Issue 13, 2000, Pages 1572-1575

Study of field electron emission from nanocrystalline diamond thin films grown from a N2/CH4 microwave plasma

(5) Xu, N S a Chen, Jun a Deng, S Z a Wu, K H b Wang, E G b

a SUN YAT SEN UNIVERSITY (China)

b INSTITUTE OF PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON EMISSION; FILM GROWTH; METHANE; NANOSTRUCTURED MATERIALS; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

FIELD ELECTRON EMISSION; MICROWAVE PLASMAS;

DIAMOND FILMS;

EID: 0033717611 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/33/13/302 Document Type: Article

Times cited : (12)

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