Electron beam technology - SEM to microcolumn

Microelectronic Engineering

Volumn 32, Issue 1-4 SPEC. ISS., 1996, Pages 113-130

  Chang, T H P ^a   Thomson, M G R ^a   Yu, M L ^a   Kratschmer, E ^a   Kim, H S ^a   Lee, K Y ^a   Rishton, S A ^a   Zolgharnain, S ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b Columbia University ^*  (United States)

Author keywords

Electron optics; Field emission sources; Lithography; Microfabrication; Scanning electron microscope

Indexed keywords

ELECTRON BEAMS; ELECTRON MICROSCOPES; ELECTRON OPTICS; FIELD EMISSION MICROSCOPES; LITHOGRAPHY; NANOTECHNOLOGY;

ELECTRON BEAM TECHNOLOGY;

SCANNING ELECTRON MICROSCOPY;

EID: 0030231712     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00366-5     Document Type: Article

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