Electron field emission from a patterned diamond-like carbon flat thin film using a Ti interfacial layer

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 5, 2000, Pages 2420-2423

  Mao, D S ^a   Wang, X ^a   Li, W ^a   Liu, X H ^a   Li, Q ^b   Xu, J F ^b   Okano, K ^c  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b EAST CHINA NORMAL UNIVERSITY   (China)

^c INTERNATIONAL CHRISTIAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT DENSITY; DEPOSITION; INTERFACES (MATERIALS); MORPHOLOGY; REACTIVE ION ETCHING; SECONDARY ION MASS SPECTROMETRY; THIN FILMS;

DIAMOND-LIKE CARBON; FOWLER-NORDHEIM (FN) PLOTS;

AMORPHOUS FILMS;

EID: 0034264894     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1289926     Document Type: Article

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