Field emission arrays by silicon micromachining

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 2, 2000, Pages 896-899

  Debski, T ^a   Volland, B ^a   Barth, W ^a   Shi, F ^a   Hudek, P ^a   Rangelow, I W ^a   Grabiec, P ^b   Studzinska, K ^b   Zaborowski, M ^b   Mitura, S ^c  

^a UNIVERSITY OF KASSEL   (Germany)

^b Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

^c LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; COATING TECHNIQUES; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON EMISSION; ETCHING; LITHOGRAPHY; MICROMACHINING; PLASMA COLLISION PROCESSES; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

FIELD EMITTER ARRAYS (FEA);

FIELD EMISSION CATHODES;

EID: 0034155425     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591293     Document Type: Article

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