Fabrication and characterisation of ultra sharp silicon field emitters

Materials Science and Engineering B

Volumn 51, Issue 1-3, 1998, Pages 150-153

  Huq, S E ^a   Grayer, G H ^a   Moon, S W ^a   Prewett, P D ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

E beam lithography; Nanometer tip; Plasma etch; Silicon field emission

Indexed keywords

ELECTRIC CURRENTS; ELECTRON BEAM LITHOGRAPHY; MASKS; MICROELECTRONICS; PLASMA ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

SILICON FIELD EMISSION;

SEMICONDUCTING SILICON;

EID: 0032000365     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(97)00249-3     Document Type: Article

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