Low-threshold cold cathodes made of nitrogen-doped chemical-vapour-deposited diamond

Nature

Volumn 381, Issue 6578, 1996, Pages 140-141

  Okano, Ken ^a   Koizumi, Satoshi ^b   Silva, S Ravi P ^c   Amaratunga, Gehan A J ^d  

^a TOKAI UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c UNIVERSITY OF SURREY   (United Kingdom)

^d UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DOPING (ADDITIVES); ELECTRON EMISSION; FILM GROWTH; NITROGEN; SYNTHETIC DIAMONDS; THIN FILMS; UREA;

DONOR DOPANTS; LOW THRESHOLD COLD CATHODES; THRESHOLD VOLTAGES;

CATHODES;

EID: 0030576265     PISSN: 00280836     EISSN: None     Source Type: Journal    
DOI: 10.1038/381140a0     Document Type: Article

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