Field emission characteristics of boron-doped diamond films prepared by MPE-CVD

Applied Surface Science

Volumn 142, Issue 1, 1999, Pages 516-520

  Chen, Yung Hsin ^a   Hu, Chen Ti ^a   Lin, I Nan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; ELECTRON EMISSION; INFRARED SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING BORON;

BORON DOPED DIAMOND FILMS; POST ANNEALING;

DIAMOND FILMS;

EID: 0032630616     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00687-4     Document Type: Article

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