Advances in arrayed microcolumn lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3099-3104

  Muray, L P ^a   Spallas, J P ^a   Stebler, C ^a   Lee, K ^a   Mankos, M ^a   Hsu, Y ^a   Gmur, M ^a   Chang, T H P ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ELECTRON BEAMS; ELECTRON OPTICS; OPTICAL INSTRUMENT LENSES; SEMICONDUCTING SILICON;

DEFLECTORS; POSITIONERS;

LITHOGRAPHY;

EID: 0034318648     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321760     Document Type: Article

References (10)

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3. T. H. P. Chang, M. G. R. Thomson, E. Kratchmer, H. S. Kim, M. L. Yu, K. Y. Lee, S. A. Rishton, and B. W. Hussey, J. Vac. Sci. Technol. B 14, 3774 (1996).
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6. K. Y. Lee, S. A. Rishton, and T. H. P. Chang, J. Vac. Sci. Technol. B 12, 3425 (1994).
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8. H. S. Kim, E. Kratchmer, M. L. Yu, M. G. R. Thomson, and T. H. P. Chang, J. Vac. Sci. Technol. B 12, 3413 (1994).
9. H. S. Gross, F. E. Prins, and D. P. Kern, Microelectron. Eng. 41/42, 498 (1998).
10. L. P. Muray, K. Y. Lee, J. P. Spallas, M. Mankos. Y. Hsu, M. R. Gmur, H. S. Gross, C. B. Stebler, and T. H. P. Chang, International Conference Micro- and Nano-Engineering 99, Rome, Italy, 21-23 September 1999.