Addressable field emission array for E-beam lithography using planar, pulsed-laser deposited amorphous diamond cathodes

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

Volumn , Issue , 1998, Pages 178-179

  Merkulov, Vladimir I ^a   Lowndes, Douglas H ^a   Baylor, L R ^a   Puretzky, A A ^a   Jellison Jr , G E ^a   Geohegan, D B ^a   Paulus, M J ^a   Thomas, C E ^a   Simpson, M L ^a   Moore, J A ^a   Voelkl, E ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DEPOSITION; ELECTRON BEAM LITHOGRAPHY; PHOTORESISTS; PULSED LASER APPLICATIONS; SEMICONDUCTING DIAMONDS;

ADDRESSABLE FIELD EMISSION ARRAY (AFEA);

FIELD EMISSION CATHODES;

EID: 0032320211     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)