Surface and Interface Chemistry for Gate Stacks on Silicon

Springer Series in Materials Science

Volumn 106, Issue , 2009, Pages 113-168

  Frank, M M ^a   Chabal, Y J ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b NONE

Author keywords

Atomic Layer Deposition; Atomic Layer Deposition Cycle; Atomic Layer Deposition Growth; Gate Stack; Interface Chemistry

Indexed keywords

EID: 85072863737     PISSN: 0933033X     EISSN: 21962812     Source Type: Book Series    
DOI: 10.1007/978-3-540-74559-4_6     Document Type: Chapter

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