In Search of Perfection: Understanding the Highly Defect-Selective Chemistry of Anisotropic Etching

Annual Review of Physical Chemistry

Volumn 54, Issue , 2003, Pages 29-56

  Hines, Melissa A ^a  

^a Department of Molecular Biology and Genetics   (United States)

Author keywords

Monte Carlo; Silicon; STM; Vibrational spectroscopy

Indexed keywords

COMPUTER SIMULATION; CORRELATION METHODS; CRYSTALLOGRAPHY; ETCHING; INFRARED SPECTROSCOPY; LITHOGRAPHY; MONTE CARLO METHODS; REACTION KINETICS; RESONATORS; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACE REACTIONS;

ANISOTROPIC ETCHANTS;

ANISOTROPY;

EID: 0043283162     PISSN: 0066426X     EISSN: None     Source Type: Book Series    
DOI: 10.1146/annurev.physchem.54.011002.103849     Document Type: Article

References (74)

1. Ensell G. 1995. J. Micromech. Microeng. 5:1-4
2. Deleted in proof
3. Knoch J, Appenzeller J, Lengeler B, Martel R, Solomon P, et al. 2000. J. Vac. Sci. Technol. A 19:1737-41
4. von Schreibers CFA. 1820. Beitrag z. Geschichte u. Kenntnis d. meteorischen Stein- u. Metal-Massen u. d. Erscheinungen welche d. niedrefallen z. begleiten pflegen. Wien
5. Sangwal K. 1987. Etching of Crystals: Theory, Experiment and Applications. Amsterdam: North-Holland. 497 pp.
6. Higashi GS, Chabal YJ, Trucks GW, Raghavachari K. 1990. Appl. Phys. Lett. 56:656-58
7. Higashi GS, Chabal YJ. 1993. In Handbook of Semiconductor Wafer Cleaning Technology, ed. W Kern, pp. 433-96. East Windsor, NJ: Noyes
8. Chabal YJ, Higashi GS, Raghavachari K, Burrows VA. 1989. J. Vac. Sci. Tech. A 7:2104-9
9. Hollins P, Pritchard J. 1985. Prog. Surf. Sci. 19:275-349
10. Malik U, Brubaker ME, Mohsin SB, Trenary M. 1987. J. Chem. Phys. 87:5554-61
11. Persson BNJ, Hoffmann FM, Ryberg R. 1986. Phys. Rev. B 34:2266-83
12. Dumas P, Chabal YJ, Higashi GS. 1990. Phys. Rev. Lett. 65:1124-27
13. Jakob P, Chabal YJ, Kuhnke K, Christman SB. 1994. Surf. Sci. 302:49-56
14. Jakob P, Chabal YJ. 1991. J. Chem. Phys. 95:2897-909
15. Hines MA, Chabal YJ, Harris TD, Harris AL. 1993. Phys. Rev. Lett. 71:2280-83
16. Raghavachari K, Jakob P, Chabal YJ. 1993. Chem. Phys. Lett. 206:156-60
17. Jakob P, Chabal YJ, Raghavachari K. 1991. Chem Phys. Lett. 187:325-33
18. Newton TA, Boiani JA, Hines MA. 1999. Surf. Sci. 430:67-79
19. Jakob P, Dumas P, Chabal YJ. 1991. Appl. Phys. Lett. 59:2968-70
20. Flidr J, Huang Y-C, Newton TA, Hines MA. 1999. Chem. Phys. Lett. 302:85-90
21. Pechman RJ, Wang X-S, Weaver JH. 1995. Phys. Rev. B 52:11412-23
22. Itchkawitz BS, McEllistrem MI, Boland JJ. 1997. Phys. Rev. Lett. 78:98-101
23. Boland JJ, Weaver JH. 1998. Phys. Today 51:34-40
24. Patrin JC, Weaver JH. 1993. Phys. Rev. B 48:17913-21
25. Chander M, Goetsch DA, Aldao CM, Weaver JH. 1995. Phys. Rev. Lett. 74:2014-17
26. Chander M, Goetsch DA, Aldao CM, Weaver JH. 1995. Phys. Rev. B 52:8288-94
27. Hannon IB, Bartelt MC, Bartelt NC, Kellogg GL. 1998. Phys. Rev. Lett. 81:4676-79
28. Angus JC, Dyble TJ. 1975. Surf. Sci. 50:175-77
29. Sánchez JR, Aldao CM, Weaver JH. 1995. J. Vac. Sci. Technol. B 13:2230-33
30. Flidr J, Huang Y-C, Newton TA, Hines MA. 1998. J. Chem. Phys. 108:5542-53
31. Hines MA. 2001. Intl. Rev. Phys. Chem. 20:645-72
32. Swartzentruber BS, Schacht M. 1995. Surf. Sci. 322:83-89
33. Reider GA, Höfer U, Heinz TR 1994. Phys. Rev. Lett. 66:1994-97
34. Bortz AB, Kalos MH, Lebowitz JL. 1975. J. Comput. Phys. 17:10-18
35. Huang YC, Flidr J, Newton TA, Hines MA. 1998. Phys. Rev. Lett. 80:4462-65
36. Flidr J, Huang Y-C, Hines MA. 1999. J. Chem. Phys. 111:6970-81
37. Jakob P, Chabal YJ, Raghavachari K, Becker RS, Becker AJ. 1992, Surf. Sci. 275:407-13
38. Hines MA, Chabal YJ, Harris TD, Harris AL. 1994. J. Chem. Phys. 101:8055-72
39. Newton TA. 2000. The evolution of the surface morphology of silicon during aqueous etching. PhD thesis. Cornell Univ., Ithaca, NY. 113 pp.
40. Allongue P, Kieling V, Gerischer H. 1995. Electrochim. Acta 40:1353-60
41. Rosamilia JM, Boone T, Sapjeta J, Raghavachari K, Highashi GS, Liu Q. 1997. Mat. Res. Soc. Symp. Proc. 477:181-90
42. Rochow EG. 1973. In Comprehensive Inorganic Chemistry, ed. JC Bailar Jr, HJ Emeléus, R Nyholm, p. 123. Oxford: Pergamon
43. Armitage DA. 1982. In Comprehensive Organometallic Chemistry, ed. G Wilkinson, pp. 1-203. Oxford, UK: Pergamon
44. Hajdasz DJ, Squires RR. 1986. J. Am. Chem. Soc. 108:3039-141
45. Holmes RR. 1990. Chem. Rev. 90:17-31
46. Homer GD, Sommer LH. 1973. J. Am. Chem. Soc. 95:7700-7
47. Garcia SP, Bao H, Manimaran M, Hines MA. 2002. J. Phys. Chem. B 106:8258-64
48. Wade CP, Chidsey CED. 1997. Appl. Phys. Lett. 71:1679-81
49. Ogawa H, Ishikawa K, Inomata C, Fujimura S. 1996. J. Appl. Phys. 79:472-77
50. Huang Y-C, Flidr J, Newton TA, Hines MA. 1998. J. Chem. Phys. 109:5025-35
51. Niwano M, Kageyama J, Kurita K, Kanashi K, Takahashi I, Miyamoto N. 1994. J. Appl. Phys. 76:2157-63
52. Miura T, Niwano M, Shoji D, Miyamoto N. 1996. J. Appl. Phys. 79:4373-80
53. Zhang X, Chabal YJ, Christman SB, Chaban EE, Garfunkel E. 2001. J. Vac. Sci. Technol. A 19:1725-29
54. Morita M, Ohmi T, Hasegawa E, Kawakami M, Ohwada M. 1990. J. Appl. Phys. 68:1272-81
55. Elwenspoek M, Jansen HV. 1998. Silicon Micromachining. Cambridge, UK: Cambridge Univ. Press. 405 pp.
56. Puers B, Sansen W. 1990. Sensors and Actuators A 23:1036-41
57. Merlos A, Acero M, Bao MH, Bouselle J, Esteve J. 1993. Sensors and Actuators A 37-38:737-43
58. Campbell SA, Cooper K, Dixon L, Earwaker R, Port SN, Schiffrin DJ. 1995. J. Micromech. Microeng. 5:209-18
59. Wind RA, Hines MA. 2000. Surf. Sci. 460:21-38
60. Palik ED, Gray HF, Klein PB. 1983. J. Electrochem. Soc. 130:956-59
61. Allongue P. 1996. Phys. Rev. Lett. 77:1986-89
62. Seidel H, Csepregi L, Heuberger A, Baumgärtel H. 1990. J. Electrochem. Soc. 137:3612-26
63. Serjeant EP, Dempsey B. 1979. Ionisation Constants of Organic Acids in Aqueous Solution. Oxford, UK: Pergamon
64. Corriu RJP, Guerin C. 1982. Adv. Organometal. Chem. 20:265-312
65. Newton TA, Huang Y-C, Lepak LA, Mines MA. 1999. J. Chem. Phys. 111:9125-28
66. Bitzer T, Richardson NV, Schiffrin DJ. 1997. Surf. Sci. 382:L686-89
67. Cotton FA, Wilkinson G. 1980. Advanced Inorganic Chemistry, pp. 374-406. New York: Wiley. 1396 pp. 4th ed.
68. Trucks GW, Raghavachari K, Higashi GS, Chabal YJ. 1990. Phys. Rev. Lett. 65:504-7
69. Bartmess JE, Scott JA, McIver RT Jr. 1979. J. Am. Chem. Soc. 101:6046-56
70. Wind RA, Jones H, Little MJ, Hines MA. 2002. J. Phys. Chem. B 106:1557-69
71. Herr E, Baltes H. 1991. Proc. Intl. Conf. Solid State Sensors Actuators (Transducers 1991), 6th, San Francisco, pp. 807-10
72. Herr E, Baltes H. 1992. Sensors and Actuators A 31:283-87
73. Sato K, Shikida M, Matsushima Y, Yamashiro T, Asaumi K, et al. 1998. Sensors and Actuators 64:87-93
74. Chadi DJ. 1987. Phys. Rev. Lett. 59:1691-94