SCOPUS 정보 검색 플랫폼

Surface Review and Letters

Volumn 8, Issue 1-2, 2001, Pages 25-31

Temperature-activated reactions of H2O and NH3 with H-passivated Si(111) surfaces

(3) Zaibi M A a,b Sebenne C A b Lacharme, J P b

a Struggle and Prevention (Tunisia)

b UNIVERSITÉ PIERRE ET MARIE CURIE (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMINE; HYDROGEN; HYDROXYL GROUP; SILICON; WATER;

ADSORPTION; ANALYTIC METHOD; ARTICLE; AUGER ELECTRON SPECTROSCOPY; CHEMICAL REACTION; DIPOLE; ELECTRON DIFFRACTION; HYDROGENATION; PRESSURE; REACTION ANALYSIS; SURFACE PROPERTY; TEMPERATURE DEPENDENCE;

EID: 0035001983 PISSN: 0218625X EISSN: None Source Type: Journal
DOI: 10.1016/S0218-625X(01)00091-4 Document Type: Article

Times cited : (8)

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