Infrared spectroscopic analysis of the Si/SiO2 interface structure of thermally oxidized silicon

Journal of Applied Physics

Volumn 87, Issue 3, 2000, Pages 1322-1330

  Queeney, K T ^a   Weldon, M K ^a   Chang, J P ^a   Chabal, Y J ^a   Gurevich, A B ^a   Sapjeta, J ^a   Opila, R L ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000269564     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372017     Document Type: Article

References (38)

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