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Applied Surface Science

Volumn 100-101, Issue , 1996, Pages 454-459

Initial stages of oxidation of hydrogen-terminated Si surface stored in air

(4) Miura, Taka Aki a Niwano, Michio a Shoji, Daisei a Miyamoto, Nobuo a

a TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR; HYDROGEN; HYDROGEN BONDS; INFRARED SPECTROSCOPY; MATHEMATICAL MODELS; OXIDES; SEMICONDUCTING SILICON; SURFACES; SYNCHROTRON RADIATION;

HYDROGEN TERMINATED SILICON SURFACE; INFRARED ABSORPTION SPECTROSCOPY; MULTIPLE INTERNAL REFLECTION GEOMETRY; NATIVE OXIDE FORMATION; SYNCHROTRON RADIATION PHOTOEMISSION SPECTROSCOPY;

OXIDATION;

EID: 0030564402 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(96)00319-4 Document Type: Article

Times cited : (27)

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