Kinetics of oxidation on hydrogen-terminated Si(100) and (111) surfaces stored in air

Journal of Applied Physics

Volumn 79, Issue 8, 1996, Pages 4373-4380

  Miura, Taka Aki ^a   Niwano, Michio ^a   Shoji, Daisei ^a   Miyamoto, Nobuo ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001655806     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362670     Document Type: Article

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