Ultra-Low-k by CVD: Deposition and Curing

Advanced Interconnects for ULSI Technology

Volumn , Issue , 2012, Pages 35-77

  Jousseaume, Vincent ^a   Zenasni, Aziz ^a   Gourhant, Olivier ^b   Favennec, Laurent ^b   Baklanov, Mikhail R ^c  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

^c IMEC   (Belgium)

Author keywords

Low k; PECVD; Porogen; UV curing; Young's modulus

Indexed keywords

EID: 84885807676     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9781119963677.ch2     Document Type: Chapter

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