-
2
-
-
0037666297
-
-
0021-8979 10.1063/1.1567460
-
K. Maex, M. Baklanov, D. Shamiryan, F. Iacopi, S. Brongersma, and Z. Yanovitskaya, J. Appl. Phys. 0021-8979 10.1063/1.1567460 93, 8793 (2003).
-
(2003)
J. Appl. Phys.
, vol.93
, pp. 8793
-
-
Maex, K.1
Baklanov, M.2
Shamiryan, D.3
Iacopi, F.4
Brongersma, S.5
Yanovitskaya, Z.6
-
3
-
-
0029250873
-
-
0378-5963 10.1016/0169-4332(94)00433-1
-
E. G. Parada, P. Gonzalez, J. Serra, B. Leon, M. Perez-Amor, J. Flicstein, and R. A. B. Devine, Appl. Surf. Sci. 0378-5963 10.1016/0169-4332(94) 00433-1 86, 294 (1995).
-
(1995)
Appl. Surf. Sci.
, vol.86
, pp. 294
-
-
Parada, E.G.1
Gonzalez, P.2
Serra, J.3
Leon, B.4
Perez-Amor, M.5
Flicstein, J.6
Devine, R.A.B.7
-
4
-
-
0034500394
-
-
0897-4756 10.1021/cm000546k
-
A. Hozumi, H. Sugimura, K. Hiraku, T. Kameyama, and O. Takai, Chem. Mater. 0897-4756 10.1021/cm000546k 12, 3842 (2000).
-
(2000)
Chem. Mater.
, vol.12
, pp. 3842
-
-
Hozumi, A.1
Sugimura, H.2
Hiraku, K.3
Kameyama, T.4
Takai, O.5
-
5
-
-
28244449804
-
-
IEEE, New York
-
K. Yoneda, M. Kato, S. Kondo, N. Kobayashi, N. Matsuki, N. Ohara, A. Fukazawa, and T. Kimura, Proceedings of the Interconnect Technology Conference 2005 (IEEE, New York, 2005), pp. 220-223.
-
(2005)
Proceedings of the Interconnect Technology Conference 2005
, pp. 220-223
-
-
Yoneda, K.1
Kato, M.2
Kondo, S.3
Kobayashi, N.4
Matsuki, N.5
Ohara, N.6
Fukazawa, A.7
Kimura, T.8
-
6
-
-
37549006635
-
-
Proceedings of the Advanced Metallization Conference, Asian Session
-
F. Ito, T. Takeuchi, and Y. Hayashi, Proceedings of the Advanced Metallization Conference, Asian Session 2005, pp. 32-33 (unpublished).
-
(2005)
, pp. 32-33
-
-
Ito, F.1
Takeuchi, T.2
Hayashi, Y.3
-
7
-
-
8644231021
-
-
IEEE, New York
-
E. Mickler, C. -T. Lin, A. T. Krishnan, C. Jin, and M. Jain, Proceedings of the Interconnect Technology Conference 2004 (IEEE, New York, 2004), pp. 190-192.
-
(2004)
Proceedings of the Interconnect Technology Conference 2004
, pp. 190-192
-
-
Mickler, E.1
Lin, C.T.2
Krishnan, A.T.3
Jin, C.4
Jain, M.5
-
8
-
-
37549014757
-
-
V. Jousseaume, A. Zenasni, L. Favennec, G. Gerbaud, M. Bardet, J. P. Simon, and A. Humbert, J. Electrochem. Soc. 54, 154 (2007).
-
(2007)
J. Electrochem. Soc.
, vol.54
, pp. 154
-
-
Jousseaume, V.1
Zenasni, A.2
Favennec, L.3
Gerbaud, G.4
Bardet, M.5
Simon, J.P.6
Humbert, A.7
-
9
-
-
33645229819
-
-
0021-8979 10.1063/1.2178393
-
F. Iacopi, Y. Travaly, B. Eyckens, C. Waldfried, T. Abell, E. P. Guyer, D. M. Gage, R. H. Dauskart, T. Sajavaara, K. Houthoofd, P. Grobet, P. Jacobs, and K. Maex, J. Appl. Phys. 0021-8979 10.1063/1.2178393 99, 053511 (2006).
-
(2006)
J. Appl. Phys.
, vol.99
, pp. 053511
-
-
Iacopi, F.1
Travaly, Y.2
Eyckens, B.3
Waldfried, C.4
Abell, T.5
Guyer, E.P.6
Gage, D.M.7
Dauskart, R.H.8
Sajavaara, T.9
Houthoofd, K.10
Grobet, P.11
Jacobs, P.12
Maex, K.13
-
10
-
-
37549024839
-
-
A. Zenasni, B. Remiat, C. Waldfried, Ch. Le Cornec, V. Jousseaume, and G. Passemard, Thin Solid Films (in press).
-
Thin Solid Films
-
-
Zenasni, A.1
Remiat, B.2
Waldfried, C.3
Le Cornec, Ch.4
Jousseaume, V.5
Passemard, G.6
-
11
-
-
50249107559
-
-
IEEE, New York
-
S. I. Nakao, J. Ushio, T. Ohno, T. Hamada, Y. Kamigaki, M. Kato, K. Yoneda, S. Kondo, and N. Kobayashi, Proceedings of the Interconnect Technology Conference 2006 (IEEE, New York, 2006), p. 66.
-
(2006)
Proceedings of the Interconnect Technology Conference 2006
-
-
Nakao, S.I.1
Ushio, J.2
Ohno, T.3
Hamada, T.4
Kamigaki, Y.5
Kato, M.6
Yoneda, K.7
Kondo, S.8
Kobayashi, N.9
-
12
-
-
33750468347
-
-
0040-6090 10.1016/j.tsf.2006.07.076
-
X. F. Lin and S. P. Smith, Thin Solid Films 0040-6090 10.1016/j.tsf.2006.07.076 515, 1087 (2006).
-
(2006)
Thin Solid Films
, vol.515
, pp. 1087
-
-
Lin, X.F.1
Smith, S.P.2
-
13
-
-
0037438045
-
-
0169-4332
-
K. Yamada, N. Fujiyama, J. Sameshima, R. Kamoto, and A. Karen, Appl. Surf. Sci. 203-204, 512 (2003). 0169-4332
-
(2003)
Appl. Surf. Sci.
, vol.203-204
, pp. 512
-
-
Yamada, K.1
Fujiyama, N.2
Sameshima, J.3
Kamoto, R.4
Karen, A.5
-
15
-
-
0015482286
-
-
0040-6090 10.1016/0040-6090(72)90373-2
-
S. P. Mukherjee and P. E. Evans, Thin Solid Films 0040-6090 10.1016/0040-6090(72)90373-2 14, 105 (1972).
-
(1972)
Thin Solid Films
, vol.14
, pp. 105
-
-
Mukherjee, S.P.1
Evans, P.E.2
-
16
-
-
0036734631
-
-
0897-4756 10.1021/cm020014z
-
Q. R. Huang, W. Volksen, E. Huang, M. Toney, C. W. Franck, and R. D. Miller, Chem. Mater. 0897-4756 10.1021/cm020014z 14, 3676 (2002).
-
(2002)
Chem. Mater.
, vol.14
, pp. 3676
-
-
Huang, Q.R.1
Volksen, W.2
Huang, E.3
Toney, M.4
Franck, C.W.5
Miller, R.D.6
-
17
-
-
37549039667
-
-
Ph.D. thesis, Paul Sabatier University, France
-
A. Zenasni, Ph.D. thesis, Paul Sabatier University, France, 2003.
-
(2003)
-
-
Zenasni, A.1
-
18
-
-
33845276940
-
-
0013-4651 10.1149/1.2353784
-
A. Zenasni, F. Ciaramella, V. Jousseaume, C. LeCornec, and G. Passemard, J. Electrochem. Soc. 0013-4651 10.1149/1.2353784 154, G6 (2007).
-
(2007)
J. Electrochem. Soc.
, vol.154
, pp. 6
-
-
Zenasni, A.1
Ciaramella, F.2
Jousseaume, V.3
Lecornec, C.4
Passemard, G.5
-
20
-
-
0005745841
-
-
0897-4756
-
M. Scarlete, S. Brienne, I. S. Buttler, and J. F. Harrod, Chem. Mater. 6, 977 (1994). 0897-4756
-
(1994)
Chem. Mater.
, vol.6
, pp. 977
-
-
Scarlete, M.1
Brienne, S.2
Buttler, I.S.3
Harrod, J.F.4
-
21
-
-
28844491832
-
-
Proceedings of Materials Research Society Symposium
-
F. Ciaramella, V. Jousseaume, S. Maitrejean, B. Remiat, M. Verdier, and G. Passemard, Proceedings of Materials Research Society Symposium, 2005 G. Passemard [MRS Bull. 863, 17 (2005)].
-
(2005)
-
-
Ciaramella, F.1
Jousseaume, V.2
Maitrejean, S.3
Remiat, B.4
Verdier, M.5
Passemard, G.6
-
22
-
-
28844491832
-
-
F. Ciaramella, V. Jousseaume, S. Maitrejean, B. Remiat, M. Verdier, and G. Passemard, Proceedings of Materials Research Society Symposium, 2005 G. Passemard [MRS Bull. 863, 17 (2005)].
-
(2005)
MRS Bull.
, vol.863
, pp. 17
-
-
Passemard, G.1
-
23
-
-
0036677392
-
-
0021-8979 10.1063/1.1487907
-
F. Iacopi, Zs. Tökei, Q. T. Le, D. Shamiryan, T. Conrad, B. Brijs, U. Kreissig, M. Van Hove, and K. Maex, J. Appl. Phys. 0021-8979 10.1063/1.1487907 92, 1548 (2002).
-
(2002)
J. Appl. Phys.
, vol.92
, pp. 1548
-
-
Iacopi, F.1
Tökei, Zs.2
Le, Q.T.3
Shamiryan, D.4
Conrad, T.5
Brijs, B.6
Kreissig, U.7
Van Hove, M.8
Maex, K.9
-
24
-
-
0000324930
-
-
0897-4756 10.1021/cm970316e
-
Q. Liu, W. Shi, F. Babonneau, and L. V. Interrante, Chem. Mater. 0897-4756 10.1021/cm970316e 9, 2434 (1997).
-
(1997)
Chem. Mater.
, vol.9
, pp. 2434
-
-
Liu, Q.1
Shi, W.2
Babonneau, F.3
Interrante, L.V.4
-
27
-
-
33644789681
-
-
1063-651X 10.1103/PhysRevE.73.031803
-
G. Dlubek, E. M. Hassan, R. Krause-Rehberg, and J. Pionteck, Phys. Rev. E 1063-651X 10.1103/PhysRevE.73.031803 73, 031803 (2006).
-
(2006)
Phys. Rev. e
, vol.73
, pp. 031803
-
-
Dlubek, G.1
Hassan, E.M.2
Krause-Rehberg, R.3
Pionteck, J.4
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