Engineering of chemical and physical properties of low-k materials by different wavelength of UV light

Advanced Metallization Conference (AMC)

Volumn , Issue , 2009, Pages 543-549

  Marsik, Premysl ^a,b   Urbanowicz, Adam ^a   Verdonck, Patrick ^a   Ferchichi, Karim ^a   DeRoest, David ^c   Prager, Lutz ^d   Baklanov, Mikhail R ^a  

^a IMEC   (Belgium)

^b MASARYK UNIVERSITY   (Czech Republic)

^c ASM BELGIUM   (Belgium)

^d LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AT-WAVELENGTH; K-VALUE; LOW-K FILMS; LOW-K MATERIALS; MATRIX MATERIALS; MATRIX PRECURSORS; NITROGEN AMBIENT; PHOTON ENERGY; POROGENS; PRECURSOR RATIOS; QUANTUM-CHEMICAL CALCULATION; RF-POWER; SI-O-SI BOND; SUBSTRATE TEMPERATURE; UV LIGHT; VARIABLE FLOW RATE;

AMORPHOUS CARBON; CURING; LIGHT; LIGHTING; METALLIZING; PHOTONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; QUANTUM CHEMISTRY; SILICON; SILICON COMPOUNDS; TARGETS;

AMORPHOUS SILICON;

EID: 70349932481     PISSN: 15401766     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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