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Microelectronic Engineering

Volumn 64, Issue 1-4, 2002, Pages 335-349

Non-destructive characterisation of porous low-k dielectric films

(2) Baklanov, M R a Mogilnikov, K P a

a IMEC (Belgium)

Author keywords

Adsorption; Ellipsometric porosimetry; Low k dielectric films; Pore size; Porosity

Indexed keywords

ADSORPTION; NEUTRON SCATTERING; NONDESTRUCTIVE EXAMINATION; PORE SIZE; POROSITY; POSITRON ANNIHILATION SPECTROSCOPY; X RAY SCATTERING;

ELLIPSOMETRIC POROSIMETRY;

DIELECTRIC FILMS;

EID: 0036776712 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(02)00807-9 Document Type: Conference Paper

Times cited : (174)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.