Chemical bonding structure of low dielectric constant Si:O:C:H films characterized by solid-state NMR

Journal of the Electrochemical Society

Volumn 152, Issue 1, 2005, Pages

  Mabboux, Pierre Yves ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE; PERMITTIVITY; SILICA; SOLID STATE PHYSICS; X RAY PHOTOELECTRON SPECTROSCOPY;

CROSS POLARIZATION; MOLECULAR ARCHITECTURE; NETWORK STRUCTURES; ORGANOSILICON MATERIALS;

SEMICONDUCTING FILMS;

EID: 12744261363     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1830353     Document Type: Article

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