Paramagnetic defect generation and microstructure change in porous low- k SiOCH films with vacuum baking

Journal of the Electrochemical Society

Volumn 157, Issue 4, 2010, Pages

  Tanbara, Kenji ^a   Kamigaki, Yoshiaki ^a  

^a KAGAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM CURING; END GROUPS; FOURIER TRANSFORM IR SPECTROSCOPY; IN-VACUUM; MICRO HOLES; MICROSTRUCTURE CHANGES; PARAMAGNETIC DEFECTS; POROUS LOW-K; QUALITY CHANGE; SIOC-H FILM; TEMPERATURE ELEVATION; ULTRALARGE SCALE INTEGRATION; VOLUME SHRINKAGE;

DEFECTS; OXYGEN; PARAMAGNETIC MATERIALS; SPIN DYNAMICS; VACUUM;

ELECTRON SPIN RESONANCE SPECTROSCOPY;

EID: 77949666266     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3301619     Document Type: Article

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