Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition

Applied Physics Letters

Volumn 79, Issue 6, 2001, Pages 803-805

  Grill, A ^a   Patel, V ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039782242     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1392976     Document Type: Article

References (7)

1. M. McCoy, 2000C&EN, 17 (November 2000).
2. L. Peters, Semicond. Int. 23, 108 (2000).
3. A. Grill, L. Perraud, V. Patel, C. Jahnes, and S. Cohen, Mater. Res. Soc. Symp. Proc. 565, 107 (1999).
4. G. Y. Lee, D. C. Edelstein, R. Conti, W. Cote, K.-S. Low, D. Dobuzinsky, G. Feng, K. Dev, P. Wrschka, P. Shafer, R. Ramachandran, A. Simpson, E. Liniger, E. Simonyi, T. Dalton, T. Spooner, C. Jahnes, E. Kaltalioglu, and A. Grill, Advanced Metallization Conference, San Diego, CA, 3-5 October 2000.
5. A. Grill and V. Patel, Mater. Res. Soc. Symp. Proc. 612, D2.9.1 (2000).
6. C. Jin and J. Wetzel, Proceedings of the IEEE 2000 International Interconnect Technology Conference, Burlingame, CA, June 5-7, 2000.
7. Y. Y. Cheng, L. C. Chao, S. M. Jang, C. H. Yu, and M. S. Liang, Proceedings of the IEEE 2000 International Interconnect Technology Conference, Burlingame, CA, June 5-7, 2000.