Structural study of nanoporous ultra low-k dielectrics using complementary techniques: Ellipsometric porosimetry, X-ray reflectivity and grazing incidence small-angle X-ray scattering

Applied Surface Science

Volumn 254, Issue 2, 2007, Pages 473-479

  Jousseaume, V ^a   Rolland, G ^a   Babonneau, D ^b   Simon, J P ^c  

^a CEA LETI   (France)

^b SP2MI   (France)

^c UNIV GRENOBLE ALPES   (France)

Author keywords

Ellipsometric porosimetry; GISAXS; Materials for microelectronics; Porous ultra low k dielectrics; Structural determination; XRR

Indexed keywords

ELLIPSOMETRY; PLASMA DIAGNOSTICS; PORE SIZE; POROSIMETERS; SCATTERING; X RAY ANALYSIS;

ELLIPSOMETRIC POROSIMETRY; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING (GISAXS); POROUS ULTRA LOW K DIELECTRICS; X-RAY REFLECTIVITY (XRR);

NANOPORES;

EID: 35348867387     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.06.043     Document Type: Article

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