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Materials Research Society Symposium Proceedings

Volumn 914, Issue , 2006, Pages 41-46

Film characterization of ultra low-k dielectrics modified by UV curing with different wavelength bands

(5) Matsuura, Masazumi a Goto, Kinya a Miura, Noriko a Hashii, Shinobu b Asai, Koyu a

a RENESAS TECHNOLOGY CORP (Japan)

b Renesas Semiconductor Engineering Corporation (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; RAMAN SPECTROSCOPY; RELAXATION PROCESSES; THIN FILMS; ULTRAVIOLET RADIATION;

FILM PROPERTIES; MOLECULAR MOTIONS; ULTRA LOW-K (ULK) DIELECTRICS; UV CURING;

DIELECTRIC MATERIALS;

EID: 33749608500 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-0914-f01-06 Document Type: Conference Paper

Times cited : (7)

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