Surface modification of high aspect ratio structures with fluoropolymer coatings using chemical vapor deposition

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3547-3550

  Gupta, Malancha ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Chemical Vapor Deposition; Polymers; Surface Modification

Indexed keywords

CAPILLARY PORES; CONTACT-ANGLE MEASUREMENTS; ELECTRON MICROPROBE ANALYSIS; FLUOROPOLYMER COATINGS; HIGH ASPECT RATIO MICROSTRUCTURES; HIGH ASPECT RATIO STRUCTURES; HIGH ASPECT RATIOS; INTERNAL SURFACES; PORE WALLS; SILICON TRENCHES; SURFACE MODIFICATION; X-RAY PHOTOELECTRON MICROSCOPIES;

ANGLE MEASUREMENT; CHEMICAL MODIFICATION; CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; ELECTRON PROBE MICROANALYSIS; ORGANIC POLYMERS; PHOTOELECTRON SPECTROSCOPY; PHOTORESISTS; PLASTIC COATINGS; POLYMERS; PRESSURE DROP; SURFACE TREATMENT; VAPORS;

ASPECT RATIO;

EID: 64349115065     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.037     Document Type: Article

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