Porogen precursors for ULK (k<2.2) PECVD dielectrics

Advanced Metallization Conference (AMC)

Volumn 2006, Issue , 2006, Pages 367-373

  Bilodeau, Steven ^a   Chen, Phil ^a   Giannetto, William ^a   Xu, Chongying ^a   Hunks, William ^a   Baum, Thomas H ^a   Roeder, Jeffrey F ^a  

^a ENTEGRIS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GRAPHITIC CARBON RESIDUES; NORBORNADIENES; POROGEN; THERMAL REMOVAL;

CURING; DIELECTRIC LOSSES; ELECTRODEPOSITION; HYDROCARBONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PORE SIZE;

DIELECTRIC FILMS;

EID: 33947234305     PISSN: 15401766     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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