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Volumn 46, Issue 9 A, 2007, Pages 5970-5974

Carbon-doped silicon oxide films with hydrocarbon network bonds for low-k dielectrics; Theoretical investigations

Author keywords

Carbon doped silicon oxide; First principles calculation; Low k material; Mechanical strength; Molecular dynamics simulation

Indexed keywords

CARBON; COMPUTER SIMULATION; DIELECTRIC MATERIALS; DOPING (ADDITIVES); SILICON COMPOUNDS; STRENGTH OF MATERIALS;

EID: 34548717106     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.5970     Document Type: Article
Times cited : (27)

References (22)
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    • N. Tajima, T. Hamada, T. Ohno, K. Yoneda, N. Kobayashi, S. Hasaka, and M. Inoue: Ext. Abstr. Solid State Devices and Materials, 2005, p. 256.
  • 16
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    • J. P. Perdew, K. Burke, and M. Ernzerhof: Phys. Rev. Lett. 77 (1996) 3865 [Errata; 78 (1997) 1396].
  • 21
    • 34548783308 scopus 로고    scopus 로고
    • J. W. Ponder: TINKER, Software Tools for Molecular Design, Version 3.9, Washington University School of Medicine, Saint Louis, 2001
    • J. W. Ponder: TINKER, Software Tools for Molecular Design, Version 3.9, Washington University School of Medicine, Saint Louis, 2001.
  • 22
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    • UVSOR, Institute of Industrial Science, University of Tokyo, Tokyo, 2004.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.