Nanocomposite Low-k SiCOH Films by Direct PECVD Using Vinyltrimethylsilane

Journal of the Electrochemical Society

Volumn 151, Issue 2, 2004, Pages

  Kwak, Sang Ki ^a   Jeong, Ki Hun ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; NANOSTRUCTURED MATERIALS; OXYGEN; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY; SILANES; SILICON COMPOUNDS;

POSTANNEALING PROCESS; PRECURSOR RATIO;

THIN FILMS;

EID: 1242309953     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1636738     Document Type: Article

References (18)

1. L. Peters, Semicond. Int., 67, 66 (2001).
2. D. J. Thomas, Y. P. Song, and K. Powell, Solid State Technol., 44, 107 (2001).
3. G. Maier, Mater. Today, 4, 22 (2001).
4. M. Morgen, E. T. Ryan, J. H. Zhao, C. Hu, T. Cho, and P. S. Ho, Annu. Rev. Mater. Sci., 30, 645 (2000).
5. T. Homma, Thin Solid Films, 278, 28 (1996).
6. B. K. Wang, M. J. Loboda, G. A. Cerny, R. F. Schneider, J. A. Seifferly, and T. Washer, in Proceedings of the 2000 IEEE International Interconnect Technology Conference, p. 52, IEEE (2000).
7. M. J. Loboda, J. A. Seifferly, R. F. Schneider, and C. M. Grove, J. Electrochem. Soc., 145, 2861 (1998).
8. M. J. Loboda, Microelectron. Eng., 50, 15 (2000).
9. A. Nara and H. Itoh, Jpn. J. Appl. Phys., Part 1, 36, 1477 (1997).
10. A. Grill and V. Patel, J. Appl. Phys., 85, 3314 (1999).
11. L. M. Han, J. S. Pan, S. M. Chen, N. Balasubramanian, J. Shi, L. S. Wong, and P. D. Foo, J. Electrochem. Soc., 148, F148 (2001).
12. T. Shirafuji, Y. Miyajaki, Y. Nakagami, Y. Hayashi, and S. Nishino, Jpn. J. Appl. Phys., Part 1, 38, 4520 (1999).
13. Y. H. Kim, S. K. Lee, and H. J. Kim, J. Vac. Sci. Technol. A, 18, 1216 (2000).
14. J. Lubgban, Jr., T. Rajagopalan, N. Mehta, B. Lahlouh, S. L. Simon, and S. Gangopadhyay, J. Appl. Phys., 92, 1033 (2002).
15. S. Mikoshiba and S. Hayase, J. Mater. Chem., 9, 591 (1999).
16. C. V. Nguyen, K. R. Carter, C. J. Hawker, J. L. Hedrick, R. L. Jaffe, R. D. Miller, J. F. Remenar, H. W. Rhee, P. M. Rice, M. F. Toney, M. Trollsas, and D. Y. Yoon, Chem. Mater., 11, 3080 (1999).
17. K. Usami, S. Sugahara, M. Kobayashi, K. Sumimura, T. Hattori, and M. Matsumura, J. Non-Cryst. Solids, 260, 199 (1999).
18. J. M. Park and S. W. Rhee, J. Electrochem. Soc., 149, F92 (2002).