A charge damage study using an electron beam low κ treatment

Proceedings of the IEEE 2004 International Interconnect Technology Conference

Volumn , Issue , 2004, Pages 190-192

  Mickler, Ed ^a   Lin, Ching Te ^a   Krishnan, Anand T ^a   Jin, Changming ^a   Jain, Manoj ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC DEPOSITION; LOW K DIELECTRICS; ORGANOSILICATE GLASS (OSG); SILICON SUBSTRATES;

DIELECTRIC MATERIALS; DIELECTRIC PROPERTIES; GATES (TRANSISTOR); NANOTECHNOLOGY; OPTICAL INTERCONNECTS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES;

ELECTRON BEAMS;

EID: 8644231021     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. G. Kloster, T. Scherban, G. Xu, J. Blaine, B. Sun, Y. Zhou, Proceedings of the IITC, 2002, pp. 242-244.
2. C. M. Flannery and M. R. Baklanov, Proceedings of the IITC, 2002, pp. 233-235.
3. K. Fujita, H. Miyajima, R. Nakata, N. Miyashita, Proceedings of the IITC, 2003, pp. 106-108.
4. A.J. Fischer, Anand T. Krishnan, Chad Kaneshige, Qi-Zhong Hong, Srikanth Krishnan, Proceedings of P2ID, 2003, pp. 28-31.
5. A. E. Grün, Zeitschrift für Naturforschung, 1957, pp. 89-95.
6. Jane C.M. Hui, Yi Xu, Chow Yeog Foong, Liao Marvin, Lin Charles, Lin Yih Shung, Proceedings of the IITC, 1998, pp. 217-219.
7. S. Ma, J. P. McVittie, and K. C. Saraswat, Proceedings of P2ID, 1996, pg. 20.
8. S. Krishnan, S. Rangan, S. Hattangady, Xing, G.; K. Brennan, M. Rodder, S. Ashok, Electron Devices Meeting, Technical Digest., International, 7-10 Dec. 1997, pp. 445-448.