Extendibility of the PECVD porogen approach for ULK materials

Materials Research Society Symposium Proceedings

Volumn 990, Issue , 2007, Pages 45-50

  Gourhant, Olivier ^a   Jousseaume, Vincent ^b   Favennec, Laurent ^a   Zenasni, Aziz ^b   Maury, Patrick ^a   Mage, Lucile ^b   Gonon, Patrice ^c   Vincent, Gilbert ^c  

^a STMICROELECTRONICS   (France)

^b CEA GRENOBLE   (France)

^c CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CURING; HEAT TREATMENT; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; ULTRAVIOLET RADIATION;

ORGANIC SPECIES; POROGENS; PRECURSORS RATIO; ULTRA-LOW DIELECTRIC CONSTANT (ULK);

DIELECTRIC MATERIALS;

EID: 41549097933     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0990-b03-06     Document Type: Conference Paper

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