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Volumn 257, Issue 13-14, 2013, Pages 2073-2119

CVD and precursor chemistry of transition metal nitrides

Author keywords

CVD; Precursor chemistry; Thin film; Titanium nitride; Transition metal nitrides

Indexed keywords


EID: 84877145128     PISSN: 00108545     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ccr.2012.12.004     Document Type: Review
Times cited : (111)

References (197)
  • 8
    • 84877143544 scopus 로고    scopus 로고
    • Richter Precision Inc.
    • Richter Precision Inc., 2012. http://www.richterprecision.com/index.html.
    • (2012)
  • 83
    • 84877150336 scopus 로고    scopus 로고
    • Thesis, Low-Temperature Chemical Vapor Deposition of Ruthenium and Manganese Nitride Thin Films
    • Knox College
    • T.S. Lazarz, Thesis, Low-Temperature Chemical Vapor Deposition of Ruthenium and Manganese Nitride Thin Films, Knox College, 2004.
    • (2004)
    • Lazarz, T.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.