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Volumn 102, Issue 3, 1998, Pages 256-259
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Growth of MoxN films via chemical vapor deposition of MoCl5 and NH3
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Author keywords
Chemical vapour deposition; Electrodes; Molybdenum nitride; Tribological coatings
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Indexed keywords
CHEMICAL ANALYSIS;
CHEMICAL VAPOR DEPOSITION;
ELECTROCHEMICAL ELECTRODES;
FILM GROWTH;
POLYCRYSTALLINE MATERIALS;
PRESSURE EFFECTS;
STOICHIOMETRY;
SURFACE STRUCTURE;
TEMPERATURE;
TRACE ELEMENTS;
TRIBOLOGY;
X RAY DIFFRACTION ANALYSIS;
ANHYDROUS AMMONIA;
ENERGY DISPERSIVE X RAY;
MOLYBDENUM NITRIDE;
MOLYBDENUM PENTACHLORIDE;
SURFACE MACROSTRUCTURE;
NITRIDES;
COATING;
FILM;
TRIBOLOGY;
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EID: 0032052957
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(98)00448-4 Document Type: Article |
Times cited : (25)
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References (13)
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