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Volumn 102, Issue 3, 1998, Pages 256-259

Growth of MoxN films via chemical vapor deposition of MoCl5 and NH3

Author keywords

Chemical vapour deposition; Electrodes; Molybdenum nitride; Tribological coatings

Indexed keywords

CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; ELECTROCHEMICAL ELECTRODES; FILM GROWTH; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; STOICHIOMETRY; SURFACE STRUCTURE; TEMPERATURE; TRACE ELEMENTS; TRIBOLOGY; X RAY DIFFRACTION ANALYSIS;

EID: 0032052957     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00448-4     Document Type: Article
Times cited : (25)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.