Preparation of tungsten nitride on alumina by chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 7 B, 2000, Pages 4558-4560

  Nagai, Masatoshi ^a   Hirano, Naoya ^a   Omi, Shinzo ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Alumina support; CVD; NH3; Synthesis; W2N; WCl6; XPS; XRD

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; PORE SIZE; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

TUNGSTEN NITRIDE;

TUNGSTEN COMPOUNDS;

EID: 0034226770     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.4558     Document Type: Article

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