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Chemical Vapor Deposition

Volumn 6, Issue 3, 2000, Pages 115-119

Optimization of titanium nitride rapid thermal CVD process

(3) De Baynast, Hélène a Bouteville, Anne a Remy, Jean Claude a

a Arts et Metiers ParisTech (France)

Author keywords

CVD; Film growth; Mechanical applications; Microelectronics; Tin

Indexed keywords

EID: 0004818575 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(SICI)1521-3862(200006)6:3<115::AID-CVDE115>3.0.CO;2-G Document Type: Article

Times cited : (10)

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